34 results
Novel Epoxy Siloxane Polymer as Low-K Dielectric
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- Journal:
- MRS Online Proceedings Library Archive / Volume 812 / 2004
- Published online by Cambridge University Press:
- 17 March 2011, F4.4
- Print publication:
- 2004
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Characterization of Cu-Al alloy/SiO2 interface microstructure
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- Journal:
- MRS Online Proceedings Library Archive / Volume 615 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, G7.5.1
- Print publication:
- 2000
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X-ray Photoelectron Spectroscopic Studies of Cu-AI alloy/SiO2 Interfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 564 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 347
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- 1999
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Optical Properties of a Polyimide for Waveguide Applications in On-Chip Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 597 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 125
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- 1999
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Homogenization of the Bilayers of Cu-Al Alloy and Pure Copper to Produce CU-0.3 at.% Al Alloy Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 281
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- 1998
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Investigation of the Homovalent Impurity in Aluminum to Form Alloys With Enhanced Interconnect Reliability
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 113
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- 1998
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Chemical-Mechanical Planarization of the Polymer Interlayer Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 511 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 277
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- 1998
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Capacitance-Voltage, Current Voltage, and Thermal Stability of Copper Alloyed With Aluminum or Magnesium
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 263
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- 1998
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Modeling of Temperature Increase Due to Joule Heating During Electromigration Measurements
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 113
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- 1996
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Chemical-Mechanical Polishing of Copper in Glycerol Based Slurries
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 237
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- 1996
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Oxidation Resistant Dilute Copper (Boron) Alloy Films Prepared by DC-Magnetron Cosputtering
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 193
- Print publication:
- 1996
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Oxidation Resistant Dilute Copper (Boron) Alloy Films Prepared by DC-Magnetron Cosputtering
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- Journal:
- MRS Online Proceedings Library Archive / Volume 428 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 17
- Print publication:
- 1996
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Reactive Ion Etching of the fluorinated polyimide film
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 455
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- 1996
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Metallization for Integrated Circuit Manufacturing
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- Journal:
- MRS Bulletin / Volume 20 / Issue 11 / November 1995
- Published online by Cambridge University Press:
- 29 November 2013, pp. 33-37
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- November 1995
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Use of Advantageous Impurity Effects in Metallization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 405 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 485
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- 1995
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Investigations of The Low Dielectric Constant Fluorinated Polyimide for Use as The Interlayer Dielectric in ULSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 31
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- 1995
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Investigations Of The Chemical-Mechanical Polishing Of Polymer Films For ILD Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 229
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- 1995
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Surface and Interface Modification of Copper for Electronic Application
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 169
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- 1994
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Growth Kinetics and Materials Properties of Cu5Si
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- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 189
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- 1994
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Chemical-Mechanical Polishing of Tungsten with Hologen-Based Slurries
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 145
- Print publication:
- 1994
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